Silicon Carbide (SiC)

Sinmat provides unique polishing solutions ranging from novel slurry products to customized polishing services.

Unique Aspects of Silicon Carbide ( SiC) Polishing Technology

  • Ultra-high Polishing rates (up to 10 times faster than existing processes)
  • Achieve atomically smooth surfaces with no damage
  • Polish all surface types (lapped or mechanically polished) into epiready finish
  • Both Si-face, C-face and single or polycrystalline surfaces

SiC Slurry Products

  • High Removal Rate/High Finish SiC Slurry (SCT, SC-SX series)

    These slurries are designed to achieve high removal rates with excellent surface finish on single crystal Si-face SiC wafers.
  • Pre CMP Mechanical Nanodiamond Slurry (SC-MC Series)

    These slurries are based on nanodiamond particles and are designed to achieve high removal rates (> 10 microns/hr.) with high finish and low sub-surface damage on single crystal wafers
  • Other SiC slurries (SC-SX series, etc)

    Sinmat has special slurry products for carbon face polishing for single crystal SiC wafers and polycrystalline SiC substrates used for optical and other applications